Join Covalent Academy this week to strengthen your knowledge on one of the most useful non-destructive thin film characterization tools available: X-Ray Reflectometry (XRR).
This technique provides highly accurate layer thickness measurement as well as electron density and interfacial roughness information on single and multilayer thin film materials. This information can be equally useful in quality control of manufacturing processes as in the characterization of pioneering research materials.
Covalent’s resident XRR expert, Dr. Colleen Frazer, will introduce the theoretical aspects of XRR then explore the effects of imperfect samples and improper modeling approaches.
XRR is acutely sensitive to exact layer thickness, density gradients, and interfaces due to its selective detection of electron density changes perpendicular to a thin film surface. This makes it a powerful tool for characterization of films grown on wafers, both during and after the film formation process. XRR is often used in combination with X-ray Diffraction (XRD) for layer characterization; however, between the two: XRR provides increased flexibility for accurate analysis of both crystalline and amorphous layers.
Approaches for the software-based modeling done to extract the XRR results are as important as the instrument setup during measurement. Effective post-processing can make the difference between accurate insights, or misleading results that can obstruct effective characterization. Dr. Colleen Frazer will be discussing XRR from measurement setup to data processing and modeling: she will give you the thinking tools you need to avoid pitfalls and maximize your project’s success.
This webinar will answer:
• Why use XRR?
• What sample alignment procedures yield the best results?
• How can results best be interpreted – without over-interpreting?
• What practical considerations are most important in the real world?
• What are some troubleshooting tactics for XRR?